Improving optical quality and reducing power consumption of integrated photonic chips in lithium niobate on insulator
In this publication we investigate different etching parameters used to etch lithium niobate on insulator in an inductively coupled plasma system, with an emphasis on the redeposition accumulated during the process.
We propose three methods on how to reduce this redeposition, which acts as a micro mask, to increase device quality and decrease optical losses. This allows to fabricate low power and high quality optical devices for classical applications like sensors, modulators and filters as well as quantum applications like on-chip quantum computation and sensors.
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